Chemical vapor deposition in manufacturing

Abstract

This chapter presents CVD technology (chemical vapor deposition), used principally for the formation of surface layers with special structure and properties on engineering and biomedical materials and applied also for the fabrication of nanostructures. The main emphasis has been placed on modern CVD methods applied in many branches of industry, from automotive through electronic to medical. The following methods are discussed: high-temperature chemical vapor deposition (CVD) processes, plasma-assisted chemical vapor deposition (PACVD), metalorganic CVD process (MOCVD), laser CVD (LCVD), hot-filament CVD (HFCVD), vapor-phase epitaxy (VPE), atomic layer deposition (ALD), as well as low-temperature CVD for the fabrication of polymer layers. The methods to produce carbon nanotubes are also disclosed. The following sections focus on the structure, properties, and the application of the selected CVD coatings such as diamond and DLC coatings, nitride, carbide, and oxide ones with high resistance to abrasion and corrosion.