A Newer Universal Model for Attaining Thin Film of Varied Composition During Sputtering

Abstract

Thin films especially solid films show versatile properties thereby sputtering and other thin film deposition techniques are getting increased attention so as to improve performance of industrial parts and components especially working under severe load, speed, environments such as very high temperature and moisture. Emphasis has been on increased life and maintenance-free life cycle. To enhance system component’ performances and to achieve desired characteristics various compositions of thin films are required. A major challenge for the development of such films is to manipulate and control microstructure and their orientation. Such films having compositional changes by minute detailing in a few % by weight needs a different positional combination of substrate and targets along with bias. To achieve this minute but desired variation while laying a layer, different combinations of targets and substrate were worked upon and presented here. An arrangement is worked out to obtain different combinations, constituent by the automated movement of the target area using the controller and servomotors combinations. Also, multiple samples can be obtained by having rotating and revolving multiple work holders, which also serves the purpose of uniform coating around the surfaces of the sample of all shapes.