XUV laser mass spectrometry for nano-scale 3D elemental profiling of functional thin films

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Abstract

Direct nano-scale microanalysis is important for photovoltaic functional thin films to characterize their homogeneity and purity. This demands combining spatial resolution in the micro/nano-scale and sensitivity in the trace-level range, which is at the moment beyond state-of-the-art. As dictated by counting statistics, the reduction of the spot size degrades the detection limit. The utilization of a tabletop XUV laser at λ = 46.9 nm has shown to dramatically improve the ablation efficiency with respect to that of visible lasers, such that ablation spot of 1 μm limits. Li-doped Cu2ZnSn(S,Se)4 (so-called kesterite) thin films were irradiated across 3D ablation arrays for hyperspectral mapping by means of time-of-flight mass spectrometry. The nominal 3D data node lattices were the initialisation perceptron, filled with measured values, and for a detailed supervised learning postprocessing, the node-to-node links were analysed by means of a 2D-kernel covariance algorithm. The latter permitted to obtain robust 3D elemental distribution functions well below the measurement spacing, giving insights into the inhomogeneity and impurities.

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Bleiner, D., Trottmann, M., Cabas-Vidani, A., Wichser, A., Romanyuk, Y. E., & Tiwari, A. N. (2020). XUV laser mass spectrometry for nano-scale 3D elemental profiling of functional thin films. Applied Physics A: Materials Science and Processing, 126(3). https://doi.org/10.1007/s00339-020-3381-3

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