Feasibility of aluminum thin film deposition on inner wall of rectangular pipes with length aspect ratio up to 50 by atomic layer deposition was studied, by solving kinetics equation of gas adsorption on inner wall of pipes. And the time for reactants to reach saturated adsorption in pipes was calculated. Furthermore, the process of aluminum deposition by atomic layer deposition was simulated by Kinetic Monte Carlo method, and a growth model for atomic layer deposition of aluminum on inner wall of long rectangular pipes was established.
CITATION STYLE
Xiong, Y., Ren, N., Wang, J., & Dong, M. (2013). Model for atomic layer deposition of aluminum on inner wall of rectangular pipes with large length aspect ratio. In 8th Pacific Rim International Congress on Advanced Materials and Processing 2013, PRICM 8 (Vol. 3, pp. 1967–1973). John Wiley and Sons Inc. https://doi.org/10.1007/978-3-319-48764-9_244
Mendeley helps you to discover research relevant for your work.