Analysis of thin bifacial silicon solar cells with locally diffused and selective back surface field

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Abstract

The aim of this work is to present the development and comparison of thin n+pp+ industrial bifacial silicon solar cells produced with the local screen-printed Al back surface field (BSF) to those with the selective BSF doped with aluminum-boron. To produce solar cells with selective BSF, the boron diffusion based on spin-on dopant was introduced in the process sequence. The thin SiO2 layer (10 nm) thermally grown did not produce good passivation on the rear face and wafers were contaminated during aluminum diffusion in the belt furnace. The implementation of selectively doped BSF improved the efficiency by reflecting minority charge carriers and the wafer contamination by belt furnace was compensated by boron diffusion. The bifacial solar cells with B-Al selective BSF achieved an efficiency of 13.7% / 8.9% (front / rear illumination) and presented lower sensitivity to the belt furnace processing and to the quality of the rear surface passivation.

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Moehlecke, A., Da Conceição Osório, V., & Zanesco, I. (2014). Analysis of thin bifacial silicon solar cells with locally diffused and selective back surface field. Materials Research, 17(5), 1328–1335. https://doi.org/10.1590/1516-1439.294614

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