High-k Gate Dielectric Materials Integrated Circuit Device Design Issues

Fan, Y. Y., Mudanai, S. P., Chen, W., Register, L. F., & Banerjee, S. K. (2005). High-k Gate Dielectric Materials Integrated Circuit Device Design Issues. In Springer Series in Advanced Microelectronics (Vol. 16, pp. 567–604). Springer Science and Business Media Deutschland GmbH. https://doi.org/10.1007/3-540-26462-0_18