RF Inductively Coupled Plasma Torches

Abstract

The basic concept of the inductively coupled radio frequency (RF) plasma has been known since the middle of the twentieth century. The technology attracted increasing attention for a wide range of applications varying from small-scale systems for elemental analysis, to large power installations for the testing of materials for the aerospace industry. Induction plasmas have also been widely used in the fiber optics industry, and more recently for the synthesis and processing of advanced materials including nano- and micron-sized high-purity spherical powders. In this chapter, the basic concepts used for the generation of inductively coupled RF plasmas are presented. These are followed by a detailed discussion of the energy coupling mechanism and induction plasma torch design. The results of a wide range of diagnostic and modeling studies are reviewed providing a description of the main features of the electromagnetic, temperature, flow, and concentration fields in the discharge