This Chapter presents the current status of phonon-dispersion studies using very high energy resolution inelastic X-ray scattering. The theoretical background and the instrumental principles are briefly summarized. This is followed by a representative selection of studies on single crystals and polycrystalline materials, including high-pressure work. The Chapter concludes with novel applications of the technique. © Springer-Verlag Berlin/Heidelberg 2006.
CITATION STYLE
Krisch, M., & Sette, F. (2006). Inelastic X-ray scattering from phonons. Topics in Applied Physics, 108, 317–369. https://doi.org/10.1007/978-3-540-34436-0_5
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