Bipolar resistive switching characteristics of transparent indium gallium zinc oxide resistive random access memory

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Abstract

This study investigates a sputtered InGaZnO (IGZO) thin film to apply into a resistive random access memory device. After the formation of an indium tin oxide (ITO)/IGZO/ITO structure at room temperature, the device exhibits a repeatable bipolar resistance switching behavior without an electroforming process and an excellent transmittance in the visible region. The conduction mechanisms for low and high resistance states are dominated by Ohm's law and space-charge-limited current behavior, respectively. In retention and endurance tests, a resistance ratio of more than 1 order remains after 104 s at 90°C and after 100 dc voltage sweeping cycles. © 2010 The Electrochemical Society.

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Chen, M. C., Chang, T. C., Huang, S. Y., Chen, S. C., Hu, C. W., Tsai, C. T., & Sze, S. M. (2010). Bipolar resistive switching characteristics of transparent indium gallium zinc oxide resistive random access memory. Electrochemical and Solid-State Letters, 13(6). https://doi.org/10.1149/1.3360181

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