Skip to main content
Journal ArticleOPEN ACCESS

TEM Study of Aluminum Oxynitride Films Prepared by Reactive R.F.-Sputtering

  • Lai L
  • Nose M
  • Chiou W
  • et al.
Microscopy and Microanalysis (2011) 17(S2) 1920-1921
DOI: 10.1017/s1431927611010476
N/ACitations
Citations of this article
6Readers
Mendeley users who have this article in their library.

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Cite

CITATION STYLE

APA

Lai, L.-C., Nose, M., Chiou, W.-A., & Saiki, A. (2011). TEM Study of Aluminum Oxynitride Films Prepared by Reactive R.F.-Sputtering. Microscopy and Microanalysis, 17(S2), 1920–1921. https://doi.org/10.1017/s1431927611010476

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free