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Journal ArticleOPEN ACCESS

Reactive Ion Etching of Copper Films

  • Schwartz G
  • Schaible P
Journal of The Electrochemical Society (1983) 130(8) 1777-1779
DOI: 10.1149/1.2120092
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Abstract

Abstract not available.\r\r\t\r\r \t\r\r \r ©1983 The Electrochemical Society, Inc.

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APA

Schwartz, G. C., & Schaible, P. M. (1983). Reactive Ion Etching of Copper Films. Journal of The Electrochemical Society, 130(8), 1777–1779. https://doi.org/10.1149/1.2120092

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