SIMPLE TECHNIQUE FOR MODIFYINIG THE PROFILE OF RESIST EXPOSED BY HOLOGRAPHIC LITHOGRAPHY.

Abstract

Holographic lithography is a rapid and convenient method of exposing low distortion periodic and quasi-periodic patterns over large areas. The authors have developed a simple, operational, nondestructive method for precisely determining the angles of laser incidence that correspond to the condition of maximum interface intensity. The method uses the exposure laser and consists of measuring the total reflectivity from the dielectric/substrate combination of a function of incidence angle. Knowledge of the dielectric thickness and the optical constants of the dielectric and substrate are not required.