Microstructures, Mechanical Behavior, and Radiation Damage of (TiVCr)x‐(TaW)1‐x Binary System High‐Entropy Alloy Films

Abstract

An experimental method for preparing high‐entropy thin films with gradient changes of alloying elements by magnetron sputtering co‐deposition is proposed in this work to evaluate the effect of alloying element composition changes on the properties of non‐equal molar ratio high-entropy alloys. The (TiVCr)x‐(TaW)1‐x binary system thin films were deposited by a magnetron sputtering system with two intermediate alloy targets. The surface morphology, element composi-tion, roughness, and phase structure of the coatings were studied with scanning electron microscope (SEM), energy dispersive X‐ray (EDX), X‐ray diffractometer (XRD), atomic force microscope (AFM), and transmission electron microscope (TEM). The results show that at x = 0.51, the films had the best mechanical properties under the action of multiple strengthening mechanisms, and the hardness and modulus reached 27.61 GPa and 274.42 GPa, respectively. Due to higher hardness and special surface morphology, the films showed a lower average friction coefficient and had excellent wear resistance with wear rates of 0.34 and 5.01 × 10−9 mm3/(N∙mm), respectively. On the other hand, it was found that forming a BCC polycrystalline structure and an amorphous‐mixed structure can improve the radiation resistance of the material.