Influence of Deposition Parameters for Cu2O and CuO Thin Films by Electrodeposition Technique: A Short Review

Abstract

The transition metal oxide-based nanomaterial attracted researchers for its various applications due to its interesting physical, chemical, and optical properties. Copper oxide thin films with different oxidation states were prepared on various transparent, nontransparent nature conducting substrates from the acidic and alkaline medium by electrodeposition technique. The deposition parameters such as potential, bath temperature, solution pH, and deposition time determine the physical, chemical, and optical properties. The complexing agents such as sodium thiosulfate, lactic acid, citric acid, and triethanolamine determine the stability of cuprous and cupric ions in the deposited films. Optical properties reported that the deposited films have direct band gap value 1.3 and 3.7 eV represents the absorbance of the deposited films in the visible region of solar spectrum. The absorbance of light in visible region, good electrical conductivity, and various nanostructure morphologies with the environment-friendly constituents are the distinctive properties of copper metal oxides.