CITATION STYLE
Hecker, M., Hübner, R., Acker, J., Hoffmann, V., Mattern, N., Ecke, R., … Zschechd, E. (2006). Advanced Barriers for Copper Interconnects. In Materials for Information Technology (pp. 283–295). Springer-Verlag. https://doi.org/10.1007/1-84628-235-7_24
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