Stand for coating deposition and coating/materials testing

Abstract

The paper describes a new laboratory stand constructed for film deposition and for testing of deposited films and materials under pulsed and continuous heat load, ion and electron irradiation. The films are formed on substrates by atoms of target materials as a result of their sputtering by ions of argon plasma. The ion energy and ion flux can be varied independently. This enables the deposition of coatings with variable composition over thickness or of multi-layer coatings. Testing of materials is carried out in plasma under ion or electron irradiation by biasing the tested sample negatively or positively, respectively. The energies of ions or electrons can be varied up to 25 keV. The applied power can reach 4000 W (40 MW/m2 power density in the case of a 1-cm2 sample) in both continuous and pulsed regimes. In pulsed regime, pulses of 1 - 99% duty cycle at 0 - 500 Hz can be applied to the sample. The pulsed particle load can be combined with a continuous load. The size of the tested sample must not exceed 100 mm in diameter. The heat flux can irradiate the whole sample or be focused at its center (minimum spot of ∼ 4mm2). Heating of the samples up to 2800 K is possible. At the same time, the backside of the tested sample could be actively cooled. This paper presents the results of deposition and testing of a B4C coating on tungsten and tungsten testing.