Chemical Vapor Deposition (CVD) and Infiltration (CVI)

Abstract

Chemical vapor deposition (CVD) takes advantage of gas phase reactants to form desired phases in situ. CVD reactions are not unlike those described in Part Four, where ceramic materials are prepared from vapor phase precursors. The significant difference is that in CVD the resultant material is in the form of a coating deposited on a substrate. Thus, the CVD process takes advantage of the lowered energies for phase formation afforded by nucleation and growth on existing surfaces.