Abstract
This chapter summarizes the current state-of-the-art for semiconductor and optoelectronic device fabrication using Metal-assisted chemical Etching (MacEtch). It details MacEtch’s history, the physics and chemistry, processing considerations, and applications in device fabrication.
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APA
Hildreth, O., & Wong, C. P. (2016). Nano-metal-assisted chemical etching for fabricating semiconductor and optoelectronic devices. In Materials for Advanced Packaging, Second Edition (pp. 879–922). Springer International Publishing. https://doi.org/10.1007/978-3-319-45098-8_21
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