Nanoindentation characterization of GaN epilayers on A-plane sapphire substrates

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Abstract

Gallium nitride (GaN) epilayers was deposited on a-axis sapphire substrate by means of metal-organic chemical vapor deposition (MOCVD) method. The GaN epilayers has been investigated in their repetition pressure-induced impairment events from nanoindentation technique and, the relative deformation effect was observed from atomic force microscopy (AFM). From the morphological studies, it is revealed that none of crack and particle was found even after the indentation beyond the critical depth on the residual indentation impression. The 'pop-in' event was explained by the interaction of the deformed region, produced by the indenter tip, with the inner threading dislocations in the GaN films. Pop-in events indicate the generation and motion of individual dislocation, which is measured under critical depth and, no residual deformation of the GaN films is observed. © 2009 Elsevier B.V. All rights reserved.

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Lin, M. H., Wen, H. C., Huang, C. Y., Jeng, Y. R., Yau, W. H., Wu, W. F., & Chou, C. P. (2010). Nanoindentation characterization of GaN epilayers on A-plane sapphire substrates. Applied Surface Science, 256(11), 3464–3467. https://doi.org/10.1016/j.apsusc.2009.12.054

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