Composition and chemical structure of ultra-thin a-C:F films deposited by RF magnetron sputtering with high pulsed bias

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Abstract

By applying a negative high pulsed voltage to Si (111) substrates, ultra-thin fluorine carbon films of about 3 nm thick are deposited and completely covered on the samples by RF magnetron sputtering with PTFE target. Angle resolved X-ray photoelectron spectroscopy analysis indicates that the surface of the deposited films is rich in fluorine, and C-F2, CF-CF and C-F groups in the outmost surface layer are much more than those in the inner layer of the films. The reason for this forming fluorine-rich phenomenon is explained and a two-layer model is proposed. © 2007 Elsevier B.V. All rights reserved.

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Tang, G., Ma, X., & Sun, M. (2007). Composition and chemical structure of ultra-thin a-C:F films deposited by RF magnetron sputtering with high pulsed bias. Diamond and Related Materials, 16(8), 1586–1588. https://doi.org/10.1016/j.diamond.2007.01.020

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