In order to improve the new micro-fabrication technology using micro-indentation and wet etching, in which the etching rate drastically decrease at the indented area and consequently micro-structure can be formed on the glass surface, the effect of the applying load on the etching rate change was investigated. The extent of the etching rate change was found to be almost constant irrespective of the amount of the applying load. Therefore, the height of the structure could be controlled simply by the etching depth as far as the densified portion remains beneath the glass surface. And some example micro-patterns were fabricated in this process. Various kinds of indentation methods were employed, including scanning a pointed tool under a load and wet abrasive blast. The patterns can be freely drawn by the use of numerical control (NC) machine. Mold pattern can be also applied, which enables drawing many lines simultaneously. In every method, the heights of the patterns were confirmed to be very uniform. This new type of the micro-fabrication method was referred to as "SMIL (Stress Masked Image Lithography)". © 2008 Elsevier B.V. All rights reserved.
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