The growth and characterization of an InN layer on AlN/Si (1 1 1)

6Citations
Citations of this article
5Readers
Mendeley users who have this article in their library.
Get full text

Abstract

The variation of the strain and structural properties of InN layers grown by molecular beam epitaxy on AlN/Si(1 1 1) substrates were investigated using reflection high-energy electron diffraction (RHEED), atomic force microscopy, scanning electron microscopy, photoluminescence, and X-ray diffraction. The RHEED intensity, the thickness of the InN wetting layer, and the lattice constant of the InN during its initial growth stage were found to be most dependent on the indium flux. Although when using a high indium flux and high growth temperature, growth would be expected to follow the Volmer-Weber growth mode during the early growth stages, in the case of the nitrogen-rich conditions, the initial InN layer grows according to the Stranski-Krastanov mode. The emission peaks are present at 0.83 eV (1500 nm) and 0.79 eV (1569 nm) for the samples made using low and high indium fluxes, respectively. These results provide important information about single-crystal hexagonal InN. © 2008 Elsevier B.V. All rights reserved.

Cite

CITATION STYLE

APA

Kim, M. D., Park, S. R., Oh, J. E., Kim, S. G., Yang, W. C., & Koo, B. H. (2009). The growth and characterization of an InN layer on AlN/Si (1 1 1). Journal of Crystal Growth, 311(7), 2016–2020. https://doi.org/10.1016/j.jcrysgro.2008.12.003

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free