Makyoh topography for the morphological study of compound semiconductor wafers and structures

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Abstract

The basic imaging principles as well as the potential application of Makyoh topography for the assessment of flatness and overall curvature of semiconductor wafers and layer structures are reviewed. The topography was used for the assessment of flatness and overall curvature of the wafers. Results proved that Makyoh topography is a simple, fast and non-expensive tool for the routine assessment of compound semiconductor structures.

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Riesz, F. (2001). Makyoh topography for the morphological study of compound semiconductor wafers and structures. Materials Science and Engineering B: Solid-State Materials for Advanced Technology, 80(1–3), 220–223. https://doi.org/10.1016/S0921-5107(00)00606-1

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