Photosensitive polymers: current status, problems and prospects. Review

Citations of this article
Mendeley users who have this article in their library.
Get full text


Photosensitive polymers investigated in the past few years in relation to problems of electrophotography and photolithography, large-scale phototechnological processes realized in practice, are reviewed. Polymeric photosensitive systems are analysed giving electrophotographic layers with a sensitivity >100 m2 J. Promising photoresists are considered based on photocrosslinking and photodegradation of polymers, Fries photorearrangement, photo-initiated acid catalysis of crosslinking and degradation of polymers and phototransformation of non-polar polymers to polycationic compounds. © 1991.




Vannikov, A. V., & Grishina, A. D. (1990). Photosensitive polymers: current status, problems and prospects. Review. Polymer Science U.S.S.R., 32(9), 1725–1758.

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free