Photosensitive polymers investigated in the past few years in relation to problems of electrophotography and photolithography, large-scale phototechnological processes realized in practice, are reviewed. Polymeric photosensitive systems are analysed giving electrophotographic layers with a sensitivity >100 m2 J. Promising photoresists are considered based on photocrosslinking and photodegradation of polymers, Fries photorearrangement, photo-initiated acid catalysis of crosslinking and degradation of polymers and phototransformation of non-polar polymers to polycationic compounds. © 1991.
Vannikov, A. V., & Grishina, A. D. (1990). Photosensitive polymers: current status, problems and prospects. Review. Polymer Science U.S.S.R., 32(9), 1725–1758. https://doi.org/10.1016/0032-3950(90)90282-B