Photosensitive polymers investigated in the past few years in relation to problems of electrophotography and photolithography, large-scale phototechnological processes realized in practice, are reviewed. Polymeric photosensitive systems are analysed giving electrophotographic layers with a sensitivity >100 m2J. Promising photoresists are considered based on photocrosslinking and photodegradation of polymers, Fries photorearrangement, photo-initiated acid catalysis of crosslinking and degradation of polymers and phototransformation of non-polar polymers to polycationic compounds. © 1991.
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