The general corrosion characteristics of TiN thin films deposited onto type 304 and 316 stainless steel by RF sputtering from a compound TiN target was investigated. In general, TiN film morphology and stoichiometry can vary considerably from film to film depending on deposition parameters and thus can play a major role in the corrosion behaviors of these films. Parametric models of the sputtering process were developed using statistial methods for design and analysis and studying the influence of a combination of variables on the properties of the TiN. The process parameters included RF power, N2partial presure, total gas pressure, substrate temperature and bias. A number of optimum conditions based on different responses were selected and corrosion testing of these films was carried out potentiostatically in 0.1N HCI and 0.1M NaCl solutions at 25°C. © 1991.
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