Sputtered TiN thin films for improved corrosion resistance

17Citations
Citations of this article
1Readers
Mendeley users who have this article in their library.
Get full text

Abstract

The general corrosion characteristics of TiN thin films deposited onto type 304 and 316 stainless steel by RF sputtering from a compound TiN target was investigated. In general, TiN film morphology and stoichiometry can vary considerably from film to film depending on deposition parameters and thus can play a major role in the corrosion behaviors of these films. Parametric models of the sputtering process were developed using statistial methods for design and analysis and studying the influence of a combination of variables on the properties of the TiN. The process parameters included RF power, N2partial presure, total gas pressure, substrate temperature and bias. A number of optimum conditions based on different responses were selected and corrosion testing of these films was carried out potentiostatically in 0.1N HCI and 0.1M NaCl solutions at 25°C. © 1991.

Cite

CITATION STYLE

APA

Bhardwaj, P., Gregory, O. J., Bragga, K., & Richman, M. H. (1991). Sputtered TiN thin films for improved corrosion resistance. Applied Surface Science, 4849(C), 555–566. https://doi.org/10.1016/0169-4332(91)90390-6

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free