The statistics of sputtering

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Abstract

The MARLOWE program was used to study the statistics of sputtering, on the example of 1 to 100 keV Au atoms normally incident on static {001} and {111} Au crystals. The yield of sputtered atoms was examined as a function of the impact point of the incident particles ("ions") on the target surfaces. There were variations on two scales. The effects of the axial and planar channeling of the ions could be traced, the details depending on the orientation of the target and the energies of the ions. Locally, the sputtering yield was very sensitive to the impact point, small changes in position often producing large changes in yield. The results indicate strongly that the sputtering yield is a random ("chaotic") function of the impact point. © 1994.

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Robinson, M. T. (1994). The statistics of sputtering. Nuclear Inst. and Methods in Physics Research, B, 90(1–4), 509–512. https://doi.org/10.1016/0168-583X(94)95604-9

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