A combined top-down/bottom-up approach to the microscopic localization of metallic nanodots

  • Spatz J
  • Chan V
  • Mößmer S
 et al. 
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Abstract

Periodic and aperiodic two-dimensional nanostructures with hierarchical order have been prepared by a combined top-down/bottom-up approach. This method allows 7 nm nanoparticles to be positioned with a accuracy of 10 nm or less, with a separation distance of several micrometers. The Figure is an optical dark field microscopy image of a square arrangement of Au dots on a Si wafer.

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Authors

  • Joachim P. Spatz

  • Vanessa Z.H. Chan

  • Stefan Mößmer

  • Frank Michael Kamm

  • Alfred Plettl

  • Paul Ziemann

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