The authors report the fabrication of nanogaps formed by electromigration from gold wires of various widths (25–80 nm). This technique is a reliable and consistent method to create quality gaps without the need of very thin gold wires. The gaps are fabricated at room temperature and ambient atmosphere in contrast to the method of performing electromigration at liquid helium temperatures and in high vacuum environments. The authors observed that every nanogap formed using this technique was free of residual particles left over from the electromigration process.
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