The microstructure and the scaling properties of films grown by plasma enhanced chemical vapor deposition are reproduced with a discrete model that takes into account the angular distribution function of the particles and the lateral growth of the films. Both the experimental and simulated surfaces exhibit a granular microstructure and an anomalous scaling behavior characterized by values of the growth exponent β that vary with the scale of measurement. Depending on the angular distribution function used in the model, values of β ranging from 0.86 to 0.2 are obtained. © 2006 The American Physical Society.
CITATION STYLE
Yanguas-Gil, A., Cotrino, J., Barranco, A., & González-Elipe, A. R. (2006). Influence of the angular distribution function of incident particles on the microstructure and anomalous scaling behavior of thin films. Physical Review Letters, 96(23). https://doi.org/10.1103/PhysRevLett.96.236101
Mendeley helps you to discover research relevant for your work.