Influence of substrate bias on the mechanical properties of ta-C:Co films prepared by filtered cathodic vacuum arc technique

doi:10.1016/S0257-8972(03)00067-7

Influence of substrate bias on the mechanical properties of ta-C:Co films prepared by filtered cathodic vacuum arc technique

Guo J
Tay B
Sun X

et al.

Surface and Coatings Technology (2003) 169-170 393-396

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Abstract

Cobalt-containing tetrahedral amorphous carbon (ta-C:Co) films were deposited by an off-plane double-bend filtered cathodic vacuum arc (FCVA) technique on silicon wafers at room temperature. The mechanical properties of the ta-C:Co films were systematically studied. Such metal composite coatings exhibit reduced stress, thus enabling the deposition of relatively thick coatings whilst retaining acceptable hardness.