Cobalt-containing tetrahedral amorphous carbon (ta-C:Co) films were deposited by an off-plane double-bend filtered cathodic vacuum arc (FCVA) technique on silicon wafers at room temperature. The mechanical properties of the ta-C:Co films were systematically studied. Such metal composite coatings exhibit reduced stress, thus enabling the deposition of relatively thick coatings whilst retaining acceptable hardness. © 2003 Elsevier Science B.V. All rights reserved.
CITATION STYLE
Guo, J. X., Tay, B. K., Sun, X. W., Ding, X. Z., & Chua, D. H. C. (2003). Influence of substrate bias on the mechanical properties of ta-C:Co films prepared by filtered cathodic vacuum arc technique. Surface and Coatings Technology, 169–170, 393–396. https://doi.org/10.1016/S0257-8972(03)00067-7
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