Reactively sputtered nickel oxide (NiO x) films provide transparent, antireflective, electrically conductive, chemically stable coatings that also are highly active electrocatalysts for the oxidation of water to O 2 (g). These NiO x coatings provide protective layers on a variety of technologically important semiconducting photoanodes, including textured crystalline Si passivated by amorphous silicon, crystalline n-type cadmium telluride, and hydrogenated amorphous silicon. Under anodic operation in 1.0 M aqueous potassium hydroxide (pH 14) in the presence of simulated sunlight, the NiO x films stabilized all of these self-passivating, high-efficiency semiconducting photoelectrodes for >100 h of sustained, quantitative solar-driven oxidation of water to O 2 (g).
CITATION STYLE
Sun, K., Saadi, F. H., Lichterman, M. F., Hale, W. G., Wang, H. P., Zhou, X., … Lewis, N. S. (2015). Stable solar-driven oxidation of water by semiconducting photoanodes protected by transparent catalytic nickel oxide films. Proceedings of the National Academy of Sciences of the United States of America, 112(12), 3612–3617. https://doi.org/10.1073/pnas.1423034112
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