Effect of Ar / O2 gas flow ratio on photocatalytic efficiency of TiO2 films prepared by DC magnetron sputtering

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Abstract

Nanometer polycrystalline anatase TiO2 films were prepared by DC magnetron sputtering after annealing. Photocatalytic experiment reveals that the sample deposited under lower Ar/O2 gas flow ratio shows better degradation activity. © 2007 IEEE.

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Zhao, L., Liping, L., & Jiawen, Q. (2007). Effect of Ar / O2 gas flow ratio on photocatalytic efficiency of TiO2 films prepared by DC magnetron sputtering. In 2007 International Nano-Optelectronics Workshop, iNOW (pp. 272–273). https://doi.org/10.1109/INOW.2007.4302987

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