Abstract
A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns. © 2009 American Institute of Physics.
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CITATION STYLE
Park, E. S., Jang, D., Lee, J., Kim, Y. J., Na, J., Ji, H., … Kim, G. T. (2009). Maskless optical microscope lithography system. Review of Scientific Instruments, 80(12). https://doi.org/10.1063/1.3266965
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