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METHODS AND SYSTEMS FOR CONTROLLING GATE DIELECTRIC INTERFACES OF MOSFETS

  • Niyogi
  • Sandip
  • Barstow S
  • et al.
US Patent Application, (2014)
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Abstract

The present invention relates to substrate process ing. More particularly, this invention relates to methods and systems for controlling the gate dielectric interface of metal on-semiconductor eld-effect transistors (MOSFETs).

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APA

Niyogi, Sandip, Barstow, S., & Lang, C.-I. (2014). METHODS AND SYSTEMS FOR CONTROLLING GATE DIELECTRIC INTERFACES OF MOSFETS. In US Patent Application (Vol. 1).

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