Molecular Depth Profiling with Cluster Ion Beams

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Abstract

The chapter begins with a brief timeline, describing the development of cluster secondary ion mass spectrometry (SIMS) as a molecular depth profiling tool. Then it examines the important aspects of molecular depth profiling in heterogeneous systems, where the concepts of qualitative and quantitative depth profiling with cluster ion beams is discussed, and examples of rudimentary 3D data reconstruction are given. The chapter moves on to describe the erosion dynamics model of molecular sputter depth profiling. Next, it discusses the chemistry of ion beam irradiation and the corresponding damage mechanisms in organic materials in order to better understand, define, and improve upon molecular depth profile characteristics. Finally, the chapter presents an overview of the important experimental parameters that should be considered during any depth profiling experiment where soft materials are being analyzed from small molecules, to large complex biological molecules. © 2013 John Wiley & Sons, Inc.

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Mahoney, C. M., & Wucher, A. (2013). Molecular Depth Profiling with Cluster Ion Beams. In Cluster Secondary Ion Mass Spectrometry: Principles and Applications (pp. 117–205). John Wiley and Sons. https://doi.org/10.1002/9781118589335.ch5

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