Abstract
An ambient scanning tunneling microscope is used to oxidize a thin Cr film to different oxidation states depending on the exposure conditions. These oxidation states have shown very different chemical and physical properties and can be used as positive or negative masks for lithography. Chromium oxide lines down to 25 nm have been formed.
Cite
CITATION STYLE
Song, H. J., Rack, M. J., Abugharbieh, K., Lee, S. Y., Khan, V., Ferry, D. K., & Allee, D. R. (1994). 25 nm chromium oxide lines by scanning tunneling lithography in air. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 12(6), 3720–3724. https://doi.org/10.1116/1.587430
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