Abstract
The hydrogenated nanocrystalline silicon (nc-Si:H) thin films were deposited by plasma enhanced chemical vapor deposition(PECVD). The as-deposited films were annealed, and the microstructure and mechanical properties were investigated by XRD, Raman spectra and nanoindenter. The results show that the crystallinity, hardness and elastic modulus have been improved when annealing at 400°C, but the mechanical properties became worse when annealing at 600°C. © 2009 IOP Publishing Ltd.
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CITATION STYLE
Peng, H. Y., Wang, J. L., Wang, L., & Zhou, B. (2009). The influence of annealing on mechanical properties of hydrogenated nanocrystalline silicon thin films. Journal of Physics: Conference Series, 152. https://doi.org/10.1088/1742-6596/152/1/012016
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