Design and characterization of the next generation nanowire amplifiers

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Abstract

Vertical nanowire surrounding gate field effect transistors (SGFETs) provide full gate control over the channel to eliminate short-channel effects. This paper presents design and characterization of a differential pair amplifier using NMOS and PMOS SGFETs with a 10nm channel length and a 2nm channel radius. The amplifier dissipates 5 W power and provides 5THz bandwidth with a voltage gain of 16, a linear output voltage swing of 0.5V, and a distortion better than 3 from a 1.8V power supply and a 20aF capacitive load. The 2nd- and 3rd-order harmonic distortions of the amplifier are -40dBm and -52dBm, respectively, and the 3rd-order intermodulation is -24dBm for a two-tone input signal with 10mV amplitude and 10GHz frequency spacing. All these parameters indicate that vertical nanowire surrounding gate transistors are promising candidates for the next generation high-speed analog and VLSI technologies.

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APA

Hamedi-Hagh, S., & Bindal, A. (2008). Design and characterization of the next generation nanowire amplifiers. VLSI Design, 2008. https://doi.org/10.1155/2008/190315

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