Effects of deposition temperature on the electrochemical deposition of zinc oxide thin films from a chloride solution

11Citations
Citations of this article
25Readers
Mendeley users who have this article in their library.

Abstract

The structural, electrical, and optical properties of ZnO thin films electrochemically deposited from a chloride solution are investigated. We focus on deposition temperatures. The band gap energy decreased from 3.50 to 3.44 eV as deposition temperatures increased from 60 to 80°C. This variation of band gap is discussed with respect to both conduction and valence band shifts, and the Burstein-Moss effect caused by numerous carriers. Increase in the carrier density of ZnO thin films was observed with increasing deposition temperature; a markedly-high carrier density of 1 × 1021 cm-3 was exhibited. The origin of the carrier density was also investigated. Although the Cl- content in ZnO thin films decreased with increasing deposition temperature, the increase of Cl- acting as a donor was indicated. © 2014 The Japan Institute of Metals and Materials.

Cite

CITATION STYLE

APA

Hori, S., Suzuki, T., Suzuki, T., Miura, S., & Nonomura, S. (2014). Effects of deposition temperature on the electrochemical deposition of zinc oxide thin films from a chloride solution. Materials Transactions, 55(4), 728–734. https://doi.org/10.2320/matertrans.M2013386

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free