Abstract
Atomistic calculations using the Stillinger-Weber interatomic potential show that stress relaxation can lower the energy of a Si(100) stepped surface below that of the flat surface. Two types of elastic interactions are identified: One is due to stress anisotropy which occurs only on single-stepped surfaces and has a logarithmic dependence on ledge separation l; the other is associated with ledge rebonding, present in both single- and double-stepped surfaces, and has a variation of l-2. On the vicinal Si(001), single-layer ledges are predicted to be favored over double-layer ledges at low miscut angles with the crossover occurring at about 1°at zero temperature, and at 3°at 500 K, in agreement with experiment. © 1990 The American Physical Society.
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CITATION STYLE
Poon, T. W., Yip, S., Ho, P. S., & Abraham, F. F. (1990). Equilibrium structures of Si(100) stepped surfaces. Physical Review Letters, 65(17), 2161–2164. https://doi.org/10.1103/PhysRevLett.65.2161
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