Plasma polymerization of tetrafluroroethylene - Towards CF2 dominated fluorocarbon films

Abstract

Fluorocarbon films with an exceptionally high CF2 content were obtained by plasma polymerization using a low pressure radio frequency discharge operated with a mixture of argon and tetrafluoroethylene. Substrates were placed in a remote position downstream the discharge. Gas pressure, discharge power, substrate position, gas composition and substrate temperature were changed to alter the chemical structure of the plasma polymers. The properties of the films were characterized by X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometry and contact angle goniometry. A pronounced increase of the CF2 content was obtained for elevated substrate temperatures and increased amounts of tetrafluoroethylene in the process gas. Applied as a model surface in studies of interfacial phenomena on polytetrafluoroethylene (PTFE), transparent PTFE-like thin films enable the use of numerous optical techniques not applicable to common PTFE foils.