Chemical Vapor Deposition of Ferrimagnetic Fe3O4 Thin Films

Abstract

Ultrathin magnetic materials with room-temperature ferromagnetism/ferrimagnetism hold great potential in spintronic applications. In this work, we report the successful controllable growth of Fe3O4 thin films using a facile chemical vapor deposition method. Room-temperature ferrimagnetism was maintained in the as-grown Fe3O4 thin films down to 4 nm. Raman spectroscopy, X-ray diffraction and X-ray photoelectron spectroscopy analysis were conducted to reveal the structure and quality of the Fe3O4 film. Magnetization measurement showed ferrimagnetic hysteresis loops in all Fe3O4 thin films. A saturation magnetization of 752 emu/cm3 was observed for the 4 nm Fe3O4 film, which was higher than that of bulk Fe3O4 materials (480 emu/cm3). Additionally, the Verwey transition at ~120 K was visible for the Fe3O4 thin films. This work provides an alternative method of synthesizing ferrimagnetic ultrathin films for electronic, spintronic, and memory device applications.