Fe x Ni 100-x nanometric films deposited by laser ablation on SiO 2 /Si substrates

Abstract

Fe x Ni 100-x nanometric films were deposited on SiO 2 /Si substrates at room temperature using the pulsed laser deposition technique. The targets were Fe-Ni amorphous magnetic foils with composition Fe 50 Ni 50 , Fe 35 Ni 65 and Fe 22 Ni 78 . Morphological and structural properties of the deposited films were investigated using scanning electron microscopy, Rutherford backscattering spectrometry, grazing incidence X-ray diffraction, and X-ray reflectivity. Electrical and magnetic characteristics of the films were investigated by using the four-point probe and the magneto-optic Kerr effect techniques, respectively. The film properties are strictly dependent on the Fe-Ni compositional ratio. © 2007 Elsevier B.V. All rights reserved.