Impact of thermal treatment on the growth of semipolar AlN on m -plane sapphire

Abstract

The interest in semipolar orientations has been increasing because the reduced piezoelectric field can improve the performance of nitride-based optoelectronic devices. However, the crystalline quality of semipolar AlN on m-plane sapphire is still not good enough to realize light emitters with sufficiently high efficiency. We performed high-temperature annealing on AlN on m-plane sapphire to improve the crystalline quality. For (10-1-3) and (11-22) AlN on m-plane sapphire, the crystalline quality improved as the annealing temperature was increased up to 1700 °C, whereas beyond 1750 °C the AlN layer started to deteriorate and desorb. The crystalline quality was further improved by additional growth of AlN. In addition, X-ray rocking curve measurements and transmission electron microscopy confirmed that the density of stacking faults was reduced after the additional growth of AlN.