Abstract
The authors present the design and fabrication of a bilayer metallic wire-grid polarizer with a period of 80 nm on a flexible polymeric substrate optimized for broadband operation ranging from the infrared down to the deep-ultraviolet range. Their high-throughput fabrication over large areas is realized by nanoimprint lithography by producing the imprint master stamps using extreme ultraviolet interference lithography. Optical measurements show that the fabricated bilayer polarizer covers a broad spectral range, starting from wavelength of 280 nm. Transverse magnetic transmission of 70% and an extinction ratio of 30 dB were realized.
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CITATION STYLE
Wang, L., Schift, H., Gobrecht, J., Ekinci, Y., Kristiansen, P. M., Solak, H. H., & Jefimovs, K. (2014). High-throughput fabrication of compact and flexible bilayer nanowire grid polarizers for deep-ultraviolet to infrared range. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 32(3). https://doi.org/10.1116/1.4874318
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