Vacancy clustering and diffusion in heavily P doped Si

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Abstract

A kinetic Monte Carlo (KMC) algorithm with a vacancy source and sink has been developed to determine the equilibrium vacancy concentration (C Ve) in Si1-x Px alloys. KMC results for CVe exhibit good agreement with the Lomer formula with added entropic terms to account for high P concentrations. They also highlight the role of CVe and clustering on self and impurity diffusion during thermal aging. © 2010 American Institute of Physics.

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Hin, C., Dresselhaus, M., & Chen, G. (2010). Vacancy clustering and diffusion in heavily P doped Si. Applied Physics Letters, 97(25). https://doi.org/10.1063/1.3527967

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