Physical incorporation of saccharin molecules into electrodeposited soft high magnetic moment CoFe alloys

Abstract

Incorporation of saccharin molecules has been studied during the galvanostatic deposition of 2.45 T CoFe alloys. The results indicate that the incorporation rate is strongly dependent on the concentration of saccharin in the plating solution. This dependence showed a pronounced maximum at Csac =0.12 g L-1, which is a result with significant practical implications. A simple physical model was developed to describe this dependence, having an excellent qualitative agreement with experimental data. The corrosion properties and surface roughness of CoFe deposits were found to be a strong function of saccharin concentration in the plating solution, i.e., the incorporation rate of saccharin molecules. © 2007 The Electrochemical Society.