904 Using a Stagnant High Temperature Gas behind a Reflected Shock Wave for Manufacturing Process

EGUCHI, T., MIKAMI, H., KOTANI, A., SAKAMURA, Y., & SUZUKI, T. (2005). 904 Using a Stagnant High Temperature Gas behind a Reflected Shock Wave for Manufacturing Process. The Proceedings of Conference of Hokuriku-Shinetsu Branch, 2005.42(0), 291–292. https://doi.org/10.1299/jsmehs.2005.42.291