High quality Bragg gratings fabricated by nanoimprint lithography

Abstract

Nanoimprint lithography (NIL) is a very promising technology for nano structure fabrication, because of its high resolution, low cost and high throughput. In this paper, we have demonstrated high-resolution rectangular Bragg gratings for DFB LD by NIL technology. For the manufacture of high quality gratings, the stamp types and residual resist thickness are discussed, and an improved Simultaneous Thermal and UV (STU) imprint process with temperature-pressure variation is introduced.