On-site tuning of the carrier lifetime in silicon for on-chip THz circuits using a focused beam of helium ions

Abstract

In this study, we demonstrate that a focused helium ion beam allows the local adjustment and optimization of the carrier lifetime in silicon-based photoswitches integrated in ultrafast on-chip terahertz-circuits. Starting with a carrier lifetime of 5.3 ps for as-grown silicon on sapphire, we monotonously reduce the carrier lifetime in integrated switches to a minimum of ∼0.55 ps for a helium ion fluence of 20 × 1015 ions/cm2. By introducing an analytical model for the carrier lifetimes in the photoswitches, we particularly demonstrate that the carrier lifetime can be adjusted locally even within single photoswitches. In turn, the demonstrated on-site tuning allows optimizing ultrafast high-frequency circuits, into which radiation-sensitive nanoscale materials, such as two-dimensional materials, are embedded.